Inpria Takes Off
Tuesday, November 15th, 2016
Inpria was one of ONAMI's first gap-program-funded startups. The year was 2007.
Inpria's novel class of photoresist materials — metal oxide photoresists — addresses emerging needs.
Inpria’s novel class of photoresist materials—metal oxide photoresists—addresses emerging needs in the electronics industry, and the community has taken notice.
Last month the American Chemical Society named Inpria one of the "Top 10 Startups to Watch": http://cen.acs.org/articles/94/i43/Inpria.html
Inpria’s novel technology exploits a five-fold increase in the resist sensitivity of EUV lithography and in its capacity to create patterns without amplification. IEEE Spectrum recently published a detailed overview on EUV lithography including Inpria’s role in the field: http://spectrum.ieee.org/semiconductors/devices/leading-chipmakers-eye-euv-lithography-to-save-moores-law
At ASML’s SmallTalk2016 Investor Day, October 31, the company outlined its strategic outlook. Download a .pdf of Hans Meiling's presentation, Role of EUV and its Business Opportunity here; the comparative sensitivity of the state-of-the-art versus Inpria’s technology is depicted on Slide 21. All the event presentations are available at: https://www.asml.com/asml/show.do?ctx=51001&rid=51002.
When: Inpria was founded in 2007 and was one of the first startups funded by ONAMI’s Commercialization Program.
Where: Inpria has labs on the Oregon State University campus and at the Advanced Technology and Manufacturing Institute located on the Hewlett-Packard Corvallis Campus. ATAMI is an OSU research and commercialization center whose focus is on advanced materials, processes and manufacturing and on very-large-scale Internet of Things. ATAMI is also one of seven ONAMI Tech Labs.
Visit Inpria's website at: http://www.inpria.com/